光纤布拉格光栅中孤立子与局部缺陷的相互作用
摘要：布拉格光栅孤子与局域吸引缺陷的相互作用的研究
作者：William C. K. Mak and Pak L. Chu (Optoelectronic Research Centre, Department of Electronic Engineering, City University of Hong Kong, Tat Chee Avenue, Kowloon, Hong Kong) and Boris A. Malomed (Department of Interdisciplinary Studies, Faculty of Engineering, Tel Aviv University, Tel Aviv, Israel)
论文ID：nlin/0212031
分类：Pattern Formation and Solitons
分类简称：nlin.PS
提交时间：2009-11-07